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I-Direct laser interference (DLIP) ehlanganiswe ne-laser-induced periodic surface structure (LIPSS) ivumela ukudalwa kwezindawo zokusebenza zezinto ezihlukahlukene.Ukuphuma kwenqubo ngokuvamile kuyanda ngokusebenzisa amandla e-laser aphakathi nendawo.Kodwa-ke, lokhu kuholela ekuqongeleleni ukushisa, okuthinta ukuqina nokuma kwephethini yangaphezulu ewumphumela.Ngakho-ke, kuyadingeka ukutadisha ngokuningiliziwe ithonya lokushisa kwe-substrate ku-morphology yezinto ezenziwe.Kulolu cwaningo, indawo yensimbi yayiphethini nge-ps-DLIP ku-532 nm.Ukuze kuphenywe umphumela wokushisa kwe-substrate ku-topography ewumphumela, ipuleti lokushisisa lalisetshenziswa ukulawula izinga lokushisa.Ukushisisa kufika ku-250 \(^{\circ }\)С kuholele ekwehleni okuphawulekayo kokujula kwezakhiwo ezakhiwe ukusuka ku-2.33 kuya ku-1.06 µm.Ukuncipha kwakuhlotshaniswa nokubonakala kwezinhlobo ezihlukene ze-LIPSS kuye ngokuthi ama-substrate zinhlamvu ami kuphi kanye ne-laser-induced surface oxidation.Lolu cwaningo lubonisa umthelela oqinile wezinga lokushisa le-substrate, elilindeleke futhi lapho ukwelashwa okungaphezulu kwenziwa ngesilinganiso esiphezulu samandla e-laser ukudala imiphumela yokunqwabelana kokushisa.
Izindlela zokwelapha ezisezindaweni ezingaphansi ezisuselwe kukukhanya kwelaser ye-ultrashort pulse zihamba phambili kwezesayensi nezimboni ngenxa yekhono lazo lokuthuthukisa izakhiwo ezingaphezulu zezinto ezibaluleke kakhulu ezifanele1.Ikakhulukazi, ukusebenza kwendawo yangokwezifiso eyenziwe nge-laser kusezingeni eliphezulu kuyo yonke imikhakha yezimboni kanye nezimo zohlelo lokusebenza1,2,3.Isibonelo, u-Vercillo et al.Izakhiwo ze-anti-icing ziye zaboniswa kuma-titanium alloys ezisetshenziswa ze-aerospace ngokusekelwe ku-laser-induced superhydrophobicity.U-Epperlein et al ubike ukuthi izici ze-nanosized ezikhiqizwe ukwakheka kwe-laser surface zingathonya ukukhula kwe-biofilm noma ukuvinjwa kwezibonelo zensimbi5.Ngaphezu kwalokho, uGuai et al.futhi ngcono izakhiwo optical amaseli organic elanga.6 Ngakho-ke, ukwakheka kwe-laser kuvumela ukukhiqizwa kwezakhi zesakhiwo ezinokulungiswa okuphezulu ngokukhipha okulawulwayo kwezinto ezingaphezulu1.
Indlela efanelekile yokuhlela i-laser yokukhiqiza izakhiwo ezinjalo ze-periodic surface i-direct laser interference shaping (DLIP).I-DLIP isuselwe ekuphazamisekeni okuseduze kobuso kwemishayo ye-laser emibili noma ngaphezulu ukuze kwakhe izindawo ezinephethini ezinezici kububanzi be-micrometer kanye ne-nanometer.Ngokuya ngenombolo nokuhlukaniswa kwemishayo ye-laser, i-DLIP ingaklama futhi idale izinhlobonhlobo zezakhiwo ezingaphezulu ze-topographic.Indlela ethembisayo iwukuhlanganisa izakhiwo ze-DLIP nezakhiwo ze-laser-induced periodic surface (LIPSS) ukuze kwakhiwe i-topography yendawo enohlelo oluyinkimbinkimbi lwesakhiwo8,9,10,11,12.Ngokwemvelo, lezi zinhlaka ziboniswe ukuthi zinikeza ukusebenza okungcono kakhulu kunamamodeli anesilinganiso esisodwa13.
Umsebenzi we-LIPSS ungaphansi kwenqubo yokuzikhulisa ngokwakho (impendulo enhle) ngokusekelwe ekuguquguqukeni okwandayo okuseduze kobuso bokusabalalisa kwamandla emisebe.Lokhu kungenxa yokwanda kwe-nanoroughness njengoba inani lama-laser pulses asetshenziswayo likhuphuka ngo-14, 15, 16. Ukushintshashintshashintsha kwenzeka ikakhulukazi ngenxa yokuphazamiseka kwegagasi elikhishwayo nenkambu kazibuthe15,17,18,19,20,21 ye-refracted and izingxenye zamagagasi ahlakazekile noma ama-plasmons angaphezulu.Ukwakhiwa kwe-LIPSS kuphinde kuthinteke ngesikhathi se-pulses22,23.Ikakhulukazi, amandla aphezulu e-laser abalulekile ekwelashweni okuphezulu kokukhiqiza okuphezulu.Lokhu ngokuvamile kudinga ukusetshenziswa kwamazinga aphezulu okuphindaphinda, okungukuthi ebangeni le-MHz.Ngenxa yalokho, ibanga lesikhathi phakathi kwama-laser pulses lifushane, okuholela emiphumeleni yokunqwabelana kokushisa 23, 24, 25, 26. Lo mphumela uholela ekwenyukeni kukonke kwezinga lokushisa elingaphezulu, okungathinta kakhulu indlela yokwenza iphethini ngesikhathi sokukhishwa kwe-laser.
Encwadini edlule, uRudenko et al.kanye noTzibidis et al.Kuxoxiswana ngomshini wokwakheka kwezakhiwo eziguquguqukayo, okufanele zibaluleke nakakhulu njengoba ukunqwabelana kokushisa kwanda19,27.Ngaphezu kwalokho, u-Bauer et al.Qondanisa inani elibalulekile lokunqwabelana kokushisa nezakhiwo ezingaphezulu kwe-micron.Ngaphandle kwale nqubo yokwakheka kwesakhiwo esibangelwa ukushisa, ngokuvamile kunenkolelo yokuthi ukukhiqizwa kwenqubo kungathuthukiswa ngokumane kukhushulwe izinga lokuphindaphinda28.Nakuba lokhu, futhi, akukwazi ukufezwa ngaphandle kokunyuka okuphawulekayo kokugcinwa kokushisa.Ngakho-ke, amasu okucubungula ahlinzeka nge-topology yamaleveli amaningi angase angaphatheki kumazinga aphezulu okuphindaphinda ngaphandle kokushintsha inqubo kinetics kanye nokwakheka kwesakhiwo9,12.Mayelana nalokhu, kubaluleke kakhulu ukuphenya ukuthi izinga lokushisa le-substrate lithinta kanjani inqubo yokubunjwa kwe-DLIP, ikakhulukazi uma wenza amaphethini angaphezulu okugqinsiwe ngenxa yokwakheka ngesikhathi esisodwa kwe-LIPSS.
Inhloso yalolu cwaningo bekuwukuhlola umthelela wezinga lokushisa elingaphansi komhlaba endaweni ewumphumela yesimo sendawo ngesikhathi sokucutshungulwa kwe-DLIP yensimbi engagqwali kusetshenziswa ama-ps pulses.Ngesikhathi sokucutshungulwa kwe-laser, izinga lokushisa lesampula le-substrate lenyuswe lafika ku-250 \(^\circ\)C kusetshenziswa ipuleti lokushisisa.Izakhiwo eziwumphumela zabonakala kusetshenziswa i-confocal microscopy, scanning electron microscopy, kanye ne-X-ray spectroscopy ehlakaza amandla.
Ochungechungeni lokuqala lokuhlolwa, i-substrate yensimbi yacutshungulwa kusetshenziswa ukucushwa kwe-DLIP enezingongolo ezimbili nesikhathi sendawo esingu-4.5 µm kanye nezinga lokushisa elingaphansi elingu-\(T_{\mathrm {s}}\) 21 \(^{\ circ }\)C, ngemuva kwalokhu okuzobizwa ngokuthi "indawo engashisi".Kulesi simo, i-pulse overlap \(o_{\mathrm {p}}\) ibanga eliphakathi kwama-pulses amabili njengomsebenzi wosayizi wendawo.Ihluka kusuka ku-99.0% (ama-pulses angu-100 isikhundla ngasinye) kuya ku-99.67% (ama-pulses angu-300 isikhundla ngasinye).Kuzo zonke izimo, ukuminyana kwamandla okuphezulu \(\Phi _\mathrm {p}\) = 0.5 J/cm\(^2\) (okulingana ne-Gaussian ngaphandle kokuphazanyiswa) kanye nemvamisa yokuphindaphinda f = 200 kHz isetshenzisiwe.Isiqondiso se-polarization ye-laser beam sihambisana nokunyakaza kwetafula lokumisa (Fig. 1a)), elihambisana nesiqondiso sejiyomethri eqondile edalwe iphethini yokuphazamiseka kwemigqa emibili.Izithombe ezimele izakhiwo ezitholiwe zisebenzisa i-electron microscope (SEM) yokuskena ziboniswa ku-Fig.1a–c.Ukuze kusekelwe ukuhlaziywa kwezithombe ze-SEM ngokwesimo sendawo, ama-Fourier transforms (ama-FFT, aboniswe ngezinhlamvu ezimnyama) ayenziwa ezakhiweni ezihlolwayo.Kuzo zonke izimo, ijiyomethri ye-DLIP ewumphumela ibibonakala ngesikhathi sendawo esingu-4.5 µm.
Okwecala \(o_{\mathrm {p}}\) = 99.0% endaweni emnyama yeFig.I-1a, ehambisana nendawo yobukhulu bokuphazanyiswa, umuntu angabona imifantu equkethe izakhiwo ezincane ezihambisanayo.Zishintshana ngamabhande agqamile ambozwe endaweni efana ne-nanoparticle.Ngoba ukwakheka okuhambisanayo phakathi kwemisele kubonakala kuncike ekuhlukanisekeni kwe-laser beam futhi kunenkathi ethi \(\Lambda _{\mathrm {LSFL-I}}\) 418\(\pm 65\) nm, kancane. ngaphansi kwe-wavelength ye-laser \(\lambda\) (532 nm) ingabizwa ngokuthi i-LIPSS nge-low spatial frequency (LSFL-I)15,18.I-LSFL-I ikhiqiza okuthiwa isignali yohlobo lwe-s ku-FFT, "s" scattering15,20.Ngakho-ke, isignali i-perpendicular ku-elementi eqinile emaphakathi eqondile, yona ekhiqizwa isakhiwo se-DLIP (\(\Lambda _{\mathrm {DLIP}}\) \(\approx\) 4.5 µm).Isignali ekhiqizwe umugqa womugqa wephethini ye-DLIP esithombeni se-FFT ibizwa ngokuthi "uhlobo lwe-DLIP".
Izithombe ze-SEM zezakhiwo ezingaphezulu ezidalwe kusetshenziswa i-DLIP.Ukuminyana kwamandla okuphezulu ngu-\(\Phi _\mathrm {p}\) = 0.5 J/cm\(^2\) (ngokulingana okungenamsindo kwe-Gaussian) kanye nezinga lokuphindaphinda f = 200 kHz.Izithombe zibonisa izinga lokushisa eliyisampula, i-polarization kanye nembondela.Ukunyakaza kwesigaba sokwenza kwasendaweni kumakwe ngomcibisholo omnyama kokuthi (a).Okufakiwe okumnyama kukhombisa i-FFT ehambisanayo etholwe esithombeni esingu-37.25\(\izikhathi\)37.25 µm SEM (esiboniswe kuze kube i-wavevector iba \(\vec {k}\cdot (2\pi )^ {-1}\) = 200 nm).Imingcele yenqubo ikhonjisiwe esithombeni ngasinye.
Uma ubheka phambili kuMfanekiso 1, ungabona ukuthi njengoba ukugqagqana \(o_{\mathrm {p}}\) kukhula, isignali ye-sigmoid igxile kakhulu ku-x-eksisi ye-FFT.Enye i-LSFL-I ijwayele ukufana kakhulu.Ngaphezu kwalokho, ukushuba okuhlobene kwesignali yohlobo lwe-s kwehlile futhi ukushuba kwesiginali yohlobo lwe-DLIP kwanda.Lokhu kungenxa yemisele egqamayo ngokuya ngokugqagqana.Futhi, isignali ye-x-eksisi phakathi kohlobo s nendawo kufanele isuke esakhiweni esinomumo ofanayo nowe-LSFL-I kodwa esinesikhathi eside (\(\Lambda _\mathrm {b}\) \(\approx \ ) 1.4 ± 0.2 µm) njengoba kukhonjisiwe kuMfanekiso 1c).Ngakho-ke, kucatshangwa ukuthi ukwakheka kwabo kuyiphethini yemigodi phakathi nendawo yomsele.Isici esisha siphinde sivele kububanzi befrikhwensi ephezulu (inombolo enkulu yegagasi) ye-ordinate.Isignali iphuma kuma-ripples ahambisanayo emithambekeni yomsele, cishe ngenxa yokuphazamiseka kwesigameko nokukhanya okubheke phambili emithambekeni9,14.Ngokulandelayo, lawa ma-ripples achazwa yi-LSFL \ (_ \ mathrm {edge} \), namasignali awo - ngohlobo -s \ (_ {\ mathrm {p)) \).
Esivivinyweni esilandelayo, izinga lokushisa lesampula lethwe lafika ku-250 °C ngaphansi kwalokho okubizwa ngokuthi "okushisiwe".Ukuhlela kwenziwa ngokwesu elifanayo lokucubungula njengokuhlola okukhulunywe ngakho esigabeni sangaphambilini (Amakhiwane 1a-1c).Izithombe ze-SEM zibonisa isimo sendawo esiwumphumela njengoba kukhonjisiwe ku-Fig. 1d–f.Ukushisa isampula ku-250 C kuholela ekwandeni kokubukeka kwe-LSFL, isiqondiso esihambisana ne-laser polarization.Lezi zakhiwo zingabonakala njenge-LSFL-II futhi zibe nesikhathi sendawo \(\Lambda _\mathrm {LSFL-II}\) sika-247 ± 35 nm.Isignali ye-LSFL-II ayiboniswa ku-FFT ngenxa yemvamisa yemodi ephezulu.Njengoba \(o_{\mathrm {p}}\) inyuka isuka ku-99.0 yaya ku-99.67\(\%\) (Fig. 1d–e), ububanzi besifunda sebhendi ekhanyayo banda, okuholele ekubonakaleni kwesignali ye-DLIP. ngaphezu kwamafrikhwensi aphezulu.izinombolo zamaza (amaza aphansi) futhi ngaleyo ndlela zishintshe ziye enkabeni ye-FFT.Imigqa yemigodi ku-Fig. 1d ingase ibe izandulela zalokho okubizwa ngokuthi ama-grooves akha i-perpendicular to LSFL-I22,27.Ngaphezu kwalokho, i-LSFL-II ibonakala isibe mfishane futhi yakhiwe ngendlela engavamile.Qaphela futhi ukuthi usayizi omaphakathi wamabhendi akhanyayo ane-nanograin morphology mancane kulesi simo.Ngaphezu kwalokho, ukusatshalaliswa kosayizi kwalawa ma-nanoparticles kubonakale kuhlakazekile kancane (noma kuholele ekuhlanganiseni kwezinhlayiyana ezincane) kunokushisisa.Ngokwekhwalithi, lokhu kungahlolwa ngokuqhathanisa izibalo 1a, d noma b, e, ngokulandelana.
Njengoba ukugqagqana \(o_{\mathrm {p}}\) kwanda kuya ku-99.67% (Fig. 1f), i-topography ehlukile yavela kancane kancane ngenxa yemisele esobala.Kodwa-ke, le migqa ibonakala ihlelekile futhi incane kakhulu kunakuFig. 1c.Umehluko ophansi phakathi kwezindawo ezikhanyayo nezimnyama zesithombe ubonakala ngekhwalithi.Le miphumela iphinde isekelwe isignali ebuthakathaka futhi ehlakazekile ye-FFT edidiyelwe ku-Fig. 1f uma kuqhathaniswa ne-FFT ku-c.Ama-striae amancane aphinde abonakala ekushiseni lapho kuqhathaniswa Umdwebo 1b no-e, okwaqinisekiswa kamuva nge-confocal microscopy.
Ngokungeziwe esivivinyweni sangaphambilini, i-polarization ye-laser beam yazungezisa ngo-90 \(^{\circ}\), okubangele ukuqondiswa kwe-polarization ukuthi kuhambisane ne-perpendicular kuplathifomu yokuma.Emkhiwaneni.I-2a-c ibonisa izigaba zakuqala zokwakheka kwesakhiwo, \(o_{\mathrm {p}}\) = 99.0% kokungashisi (a), kushisisa (b) nokushisisa 90\(^{\ circ }\ ) - Ikesi nge-polarization ejikelezayo (c).Ukuze ubone ngeso lengqondo i-nanotopography yezakhiwo, izindawo ezimakwe ngezikwele ezinemibala ziboniswa ku-Fig.2d, ngesilinganiso esikhulisiwe.
Izithombe ze-SEM zezakhiwo ezingaphezulu ezidalwe kusetshenziswa i-DLIP.Imingcele yenqubo iyafana nakuFig.1.Isithombe sibonisa izinga lokushisa lesampula \(T_s\), i-polarization kanye nokugqagqana kwe-pulse \(o_\mathrm {p}\).I-inset emnyama futhi ibonisa ukuguqulwa kwe-Fourier okuhambisanayo.Izithombe ku-(d)-(i) ziyizikhulisi zezindawo ezimakwe ku-(a)-(c).
Kulokhu, kungabonakala ukuthi izakhiwo ezisezindaweni ezimnyama ze-Fig. 2b,c zizwela i-polarization ngakho-ke zibizwa ngokuthi LSFL-II14, 20, 29, 30. Ngokuphawulekayo, ukuma kwe-LSFL-I nakho kuyazungezwa ( Umdwebo 2g, i), ongabonwa kusukela ekuqondisweni kwesignali yohlobo lwe-s ku-FFT ehambisanayo.Umkhawulokudonsa wenkathi ye-LSFL-I ubonakala mkhulu uma uqhathaniswa nesikhathi b, futhi ububanzi bawo bushintshelwa ezikhathini ezincane ku-Fig. 2c, njengoba kuboniswa isignali yohlobo luka-s olusabalele kakhulu.Ngakho, isikhathi esilandelayo sendawo ye-LSFL singabonwa kusampula kumazinga okushisa ahlukene: \(\Lambda _{\mathrm {LSFL-I}}}\) = 418\(\pm 65\) nm ku-21 ^{\circ }\ )C (Fig. 2a), \(\Lambda _{\mathrm {LSFL-I}}\) = 445\(~\pm\) 67 nm kanye \(\Lambda _{\mathrm {LSFL-II) }} \) = 247 ± 35 nm ku-250 ° C (Fig. 2b) ye-polarization.Ngokuphambene, isikhathi sendawo se-p-polarization kanye no-250 \(^{\circ }\)C silingana no-\(\Lambda _{\mathrm {LSFL-I))\)\) = 390\(\pm 55\ ) nm kanye \(\ Lambda_{\mathrm{LSFL-II}}\) = 265±35 nm (Fig. 2c).
Ngokuphawulekayo, imiphumela ibonisa ukuthi ngokunyusa izinga lokushisa lesampula, i-surface morphology ingashintsha phakathi kwezinto ezimbili ezeqisayo, okuhlanganisa (i) indawo equkethe kuphela izakhi ze-LSFL-I kanye (ii) nendawo embozwe nge-LSFL-II.Ngenxa yokuthi ukwakheka kwalolu hlobo oluthile lwe-LIPSS ezindaweni zensimbi kuhlotshaniswa nezingqimba ze-surface oxide, ukuhlaziywa kwe-X-ray ye-energy dispersive (EDX) kwenziwa.Ithebula 1 lifingqa imiphumela etholiwe.Ukunqunywa ngakunye kwenziwa ngesilinganiso sokungenani izibukeli ezine ezindaweni ezihlukene endaweni yesampula ecutshunguliwe.Izilinganiso zenziwa kumazinga okushisa esampula ahlukene \(T_\mathrm{s}\) kanye nokuma okuhlukile kwendawo yesampula equkethe izindawo ezingahlelekile noma ezingahleliwe.Izilinganiso futhi ziqukethe ulwazi mayelana nezingqimba ezijulile ezingenalutho ezilele ngokuqondile ngaphansi kwendawo encibilikisiwe ehlanganisiwe, kodwa ngaphakathi kokujula kokungena kwe-electron yokuhlaziywa kwe-EDX.Kodwa-ke, kufanele kuqashelwe ukuthi i-EDX ilinganiselwe emandleni ayo okulinganisa okuqukethwe komoya-mpilo, ngakho-ke lawa manani lapha anganikeza kuphela ukuhlolwa kwekhwalithi.
Izingxenye ezingaphathwanga zamasampuli azizange zibonise amanani abalulekile omoya-mpilo kuwo wonke amazinga okushisa okusebenza.Ngemva kokwelashwa nge-laser, amazinga komoyampilo anda kuzo zonke izimo31.Umehluko ekwakhiweni kwesici phakathi kwamasampula amabili angakahlanzwa ubunjengokulindelekile kumasampula ensimbi yokuhweba, futhi kwatholakala amanani ekhabhoni aphezulu kakhulu uma kuqhathaniswa neshidi ledatha lomkhiqizi lensimbi ye-AISI 304 ngenxa yokungcoliswa kwe-hydrocarbon32.
Ngaphambi kokuxoxa ngezizathu ezingaba khona zokuncipha kokushona kwe-groove ablation kanye noshintsho ukusuka ku-LSFL-I ukuya ku-LSFL-II, ukuminyana kwe-spectral yamandla (PSD) kanye namaphrofayili okuphakama kuyasetshenziswa.
(i) I-quasi-two-dimensional normalized power spectral density (Q2D-PSD) yendawo iboniswa njengezithombe ze-SEM kuFigure 1 no-2. 1 kanye no-2. Njengoba i-PSD ijwayelekile, ukwehla kwesignali yesamba kufanele kube kuqondwa njengokukhuphuka kwengxenye engaguquki (k \(\le\) 0.7 µm\(^{-1}\), engabonisiwe), okungukuthi ubushelelezi.(ii) Iphrofayili yobude bendawo emaphakathi.Isampula lokushisa \(T_s\), ukugqagqana \(o_{\mathrm {p}}\), kanye ne-laser polarization E ehlobene nomumo \(\vec {v}\) wokunyakaza kwenkundla yokuma kuboniswa kuzo zonke iziqephu.
Ukuze kulinganiswe umbono wezithombe ze-SEM, isilinganiso samandla esijwayelekile esijwayelekile sikhiqizwe okungenani ezithombeni ezintathu ze-SEM kupharamitha ngayinye esethwe ngesilinganiso sawo wonke ama-spectral densities ohlangothi olulodwa (1D) (ama-PSD) ohlangothini luka x noma y.Igrafu ehambisanayo iboniswa ku-Fig. 3i ebonisa ukushintshwa kwemvamisa yesiginali kanye negalelo layo elihlobene ne-spectrum.
Emkhiwaneni.3ia, c, e, isiqongo se-DLIP sikhula eduze \(k_{\mathrm {DLIP}}~=~2\pi\) (4.5 µm)\(^{-1}\) = 1.4 µm \ ( ^{- 1}\) noma ama-harmonic aphezulu ahambisanayo njengoba ukugqagqana kukhuphuka \(o_{\mathrm {p))\).Ukwanda kwe-amplitude eyisisekelo kuhlotshaniswa nokuthuthukiswa okunamandla kwesakhiwo se-LRIB.I-amplitude yama-harmonics aphakeme iyanda ngokunyuka komthambeko.Kumisebenzi engunxande njengezimo ezikhawulelayo, ukulinganiselwa kudinga inani elikhulu lamafrikhwensi.Ngakho-ke, ukuphakama okungaba ngu-1.4 µm\(^{-1}\) ku-PSD nama-harmonic ahambisanayo angasetshenziswa njengamapharamitha wekhwalithi womumo we-groove.
Ngokuphambene, njengoba kuboniswe ku-Fig. 3(i)b,d,f, i-PSD yesampula eshisayo ibonisa iziqongo ezibuthakathaka nezibanzi ezinesignali encane kuma-harmonics afanele.Ngaphezu kwalokho, emkhiwaneni.I-3(i)f ibonisa ukuthi isignali yesibili ye-harmonic idlula ngisho nesignali eyisisekelo.Lokhu kukhombisa ukwakheka kwe-DLIP okungajwayelekile nokungaphimiseki kakhulu kwesampula eshisayo (uma kuqhathaniswa ne-\(T_s\) = 21\(^\circ\)C).Esinye isici ukuthi njengoba ukugqagqana \(o_{\mathrm {p}}\) kwanda, isiginali ye-LSFL-I ewumphumela ishintsha iye kunani elincane le-wavenumber (isikhathi eside).Lokhu kungachazwa ngokukhuphuka kokuqina kwemiphetho yemodi ye-DLIP kanye nokwanda kwendawo okuhlobene ne-engeli ye-icidence14,33.Ukulandela lo mkhuba, ukunwetshwa kwesiginali ye-LSFL-I nakho kungachazwa.Ngaphezu kwemithambeka ewumqansa, kukhona nezindawo eziyisicaba phansi nangaphezulu kwama-crests wesakhiwo se-DLIP, okuvumela ububanzi obubanzi bezikhathi ze-LSFL-I.Ngezinto ezimunca kakhulu, isikhathi se-LSFL-I sivamise ukulinganiselwa ngokuthi:
lapho \(\theta\) kuyi-engeli yesigameko, futhi imibhalo engezansi u-s no-p ibhekisela ekuhlukaniseni okuhlukile33.
Kufanele kuqashelwe ukuthi indiza yesigameko yokusetha i-DLIP ivame ukuhambisana nokunyakaza kweplathifomu yokumisa, njengoba kuboniswe kuMfanekiso 4 (bona isigaba se-Materials and Methods).Ngakho-ke, i-s-polarization, njengomthetho, ihambisana nokunyakaza kwesiteji, futhi i-p-polarization i-perpendicular kuyo.Ngokusho kwe-equation.(1), nge-s-polarization, ukusabalala nokushintshwa kwesignali ye-LSFL-I kuya kuzinombolo zamagagasi amancane kulindeleke.Lokhu kungenxa yokwanda \(\theta\) kanye nobubanzi be-angular \(\theta \pm \delta \theta\) njengoba ukujula komsele kukhuphuka.Lokhu kungabonwa ngokuqhathanisa iziqongo ze-LSFL-I ku-Fig. 3ia,c,e.
Ngokwemiphumela ekhonjiswe ku-fig.1c, LSFL\(_\mathrm {edge}\) iyabonakala futhi ku-PSD ehambisanayo kufig.3 okungukuthi.Emkhiwaneni.I-3ig,h ibonisa i-PSD ye-p-polarization.Umehluko eziqongweni ze-DLIP ugqama kakhulu phakathi kwamasampuli ashisayo nangashisiwe.Kulesi simo, isignali esuka ku-LSFL-I igqagqana nama-harmonics aphakeme we-DLIP peak, engeza isignali eduze nobude beza obungamile.
Ukuze kuxoxwe ngemiphumela ngokuningiliziwe, ku-Fig. 3ii ikhombisa ukujula kwesakhiwo kanye nokugqagqana phakathi kwama-pulses okusabalalisa ubude bomugqa we-DLIP kumazinga okushisa ahlukahlukene.Iphrofayili yobude obuqondile bondawo itholwe ngokwesilinganiso samaphrofayili obude obuqondile ayishumi azungeze indawo emaphakathi yesakhiwo se-DLIP.Kuzinga lokushisa ngalinye elisetshenzisiwe, ukujula kwesakhiwo kuyanda ngokunqwabelana kwe-pulse okwandayo.Iphrofayela yesampula eshisiwe ibonisa ama-grooves anamanani amaphakathi we-peak-to-peak (pvp) angu-0.87 µm we-s-polarization kanye no-1.06 µm we-p-polarization.Ngokuphambene, i-s-polarization kanye ne-p-polarization yesampula engashisiwe ibonisa i-pvp engu-1.75 µm no-2.33 µm, ngokulandelanayo.I-pvp ehambisanayo iboniswa kuphrofayili yobude kufig.3 ii.Isilinganiso ngasinye se-PvP sibalwa ngesilinganiso sama-PvP ayisishiyagalombili.
Ngaphezu kwalokho, emkhiwaneni.I-3iig,h ibonisa ukuphakama kokusabalalisa kwe-p-polarization ngokuya ngesistimu yokuma nokunyakaza komsele.Isiqondiso se-p-polarization sinomthelela omuhle ekujuleni kwe-groove njengoba kuholela ku-pvp ephakeme kancane ku-2.33 µm uma kuqhathaniswa ne-s-polarization ku-1.75 µm pvp.Lokhu kuhambisana nemisele kanye nokunyakaza kwesistimu yesikhulumi sokuma.Lo mphumela ungabangelwa isakhiwo esincane esimweni se-s-polarization uma kuqhathaniswa nesimo se-p-polarization (bheka i-Fig. 2f, h), okuzoxoxwa ngayo ngokuqhubekayo esigabeni esilandelayo.
Injongo yengxoxo iwukuchaza ukwehla kokushona kwemisele ngenxa yoshintsho lwesigaba esikhulu se-LIPS (LSFL-I ukuya ku-LSFL-II) esimweni samasampuli ashisayo.Ngakho phendula imibuzo elandelayo:
Ukuze uphendule umbuzo wokuqala, kubalulekile ukucabangela izindlela ezibhekene nokunciphisa ukukhishwa kwe-ablation.Ngokushaya kwe-pulse okukodwa endaweni evamile, ukujula kokukhishwa kungachazwa ngokuthi:
lapho \(\delta _{\mathrm {E}}\) iwukujula kokungena kwamandla, \(\Phi\) kanye \(\Phi _{\mathrm {th}}\) kungukushelela kokumuncwa kanye nokushelela kwe-Ablation umkhawulo, ngokulandelana34.
Ngokwezibalo, ukujula kokungena kwamandla kunomphumela ophindaphindayo ekujuleni kokukhishwa, kuyilapho ukuguqulwa kwamandla kunomphumela we-logarithmic.Ngakho izinguquko zokukhuluma ngokushelelayo azithinti \(\Delta z\) inqobo nje uma \(\Phi ~\gg ~\Phi _{\mathrm {th}}\).Kodwa-ke, i-oxidation eqinile (isibonelo, ngenxa yokwakheka kwe-chromium oxide) iholela kumabhondi aqinile e-Cr-O35 uma kuqhathaniswa namabhondi e-Cr-Cr, ngaleyo ndlela kwandise umkhawulo wokukhipha.Ngokulandelayo, \(\Phi ~\gg ~\Phi _{\mathrm {th}}\) ayisaneliseki, okuholela ekwehleni okusheshayo kokujula kokukhishwa kwe-ablation ngokuncipha kokuminyana kokugeleza kwamandla.Ukwengeza, ukuhlobana phakathi kwesimo se-oxidation kanye nesikhathi se-LSFL-II kuyaziwa, okungachazwa ngezinguquko ku-nanostructure ngokwayo kanye nezakhiwo ze-optical ebusweni ezibangelwa i-oxidation ebusweni30,35.Ngakho-ke, ukusatshalaliswa okuqondile kwendawo yokumuncwa \(\Phi\) kungenxa ye-dynamics eyinkimbinkimbi yokusebenzisana phakathi kwenkathi yesakhiwo kanye nogqinsi longqimba lwe-oxide.Ngokuya esikhathini, i-nanostructure ithonya kakhulu ukusatshalaliswa kwe-flux yamandla abanjwe ngenxa yokwanda okubukhali ensimini, ukuvuswa kwama-plasmons angaphezulu, ukudluliswa kokukhanya okungavamile noma ukusabalalisa17,19,20,21.Ngakho-ke, i-\(\Phi\) ihluke kakhulu eduze kwendawo, futhi \(\delta _ {E}\) cishe ayisenakwenzeka nge-coefficient eyodwa yokumunca \(\alpha = \delta _{\mathrm {opt} } } ^ { -1} \approx \delta _{\mathrm {E}}^{-1}\) yayo yonke ivolumu yendawo eseduze.Njengoba ubukhulu befilimu ye-oxide buncike kakhulu esikhathini sokuqiniswa [26], umphumela we-nomenclature uncike kuzinga lokushisa lesampula.Ama-micrographs abonakalayo aboniswe kumfanekiso we-S1 ku-Supplementary Material abonisa izinguquko ezimpahleni zokubona.
Le miphumela ichaza ngokwengxenye ukujula komsele okungashoni esimweni sezakhiwo ezincane ezingaphezulu kuMfanekiso 1d,e no-2b,c kanye no-3(ii)b,d,f.
I-LSFL-II yaziwa ngokwenza kuma-semiconductors, ama-dielectrics, nezinto ezithambekele ku-oxidation14,29,30,36,37.Esimweni sokugcina, ukushuba kongqimba lwe-oxide engaphezulu kubaluleke kakhulu30.Ukuhlaziywa kwe-EDX okwenziwe kwembula ukwakheka kwama-oxide angaphezulu endaweni ehlelekile.Ngakho, kumasampuli angashisi, umoya-mpilo wendawo ubonakala unomthelela ekwakhekeni kwezinhlayiya zegesi ngokwengxenye kanye nokwakheka kwama-oxide angaphezulu.Zombili lezi zimo zinegalelo elikhulu kule nqubo.Ngokuphambene nalokho, kumasampula ashisayo, ama-metal oxides ezindawo ezihlukahlukene ze-oxidation (SiO\(_{\mathrm {2}}\), Cr\(_{\mathrm {n}} \)O\(_{\mathrm { m}}\ ), Fe\(_{\mathrm {n}}\)O\(_{\mathrm {m}}\), NiO, njll.) acacile 38 avuna.Ngaphandle kwesendlalelo se-oxide edingekayo, ukuba khona kwe-subwavelength roughness, ikakhulukazi imvamisa yendawo ephezulu ye-LIPSS (HSFL), kuyadingeka ukuze kwakhiwe izindlela ezidingekayo ze-subwavelength (d-type) amandla14,30.Imodi yokugcina ye-LSFL-II yokuqina iwumsebenzi we-HSFL amplitude nogqinsi lwe-oxide.Isizathu sale modi ukuphazanyiswa kokukhanya okuhlakazekile yi-HSFL nokukhanya okuphikisiwe kumpahla futhi kusakazeke ngaphakathi kwe-surface dielectric material20,29,30.Izithombe ze-SEM zonqenqema lwephethini engaphezulu kumfanekiso we-S2 esigabeni Sezinto Zokungezelela ziyizinkomba ze-HSFL esivele ikhona.Lesi sifunda sangaphandle sithintwa kancane indawo ezungezile yokusabalalisa kokuqina, okuvumela ukwakheka kwe-HSFL.Ngenxa yokulinganisa kokusatshalaliswa kokuqina, lo mphumela uyenzeka futhi ngokuhambisana nokuskena.
Ukushisa okuyisampula kuthinta inqubo yokwakheka kwe-LSFL-II ngezindlela ezimbalwa.Ngakolunye uhlangothi, ukukhuphuka kwezinga lokushisa lesampula \(T_\mathrm{s}\) kunomthelela omkhulu kakhulu kuzinga lokuqiniswa nokupholisa kunobukhulu bengqimba encibilikisiwe26.Ngakho, isixhumi esibonakalayo esiwuketshezi sesampula esishisayo sichayeka kumoya-mpilo we-ambient isikhathi eside.Ngaphezu kwalokho, ukuqiniswa okubambezelekile kuvumela ukuthuthukiswa kwezinqubo eziyinkimbinkimbi ze-convective ezandisa ukuxutshwa komoya-mpilo nama-oxide nge-steel26.Lokhu kungaboniswa ngokuqhathanisa ukujiya kongqimba lwe-oxide olwakhiwe kuphela ngokusakazwa (\(\Lambda _\mathrm {diff}=\sqrt{D~\times ~t_\mathrm {s}}~\le ~15\) nm) Isikhathi esihambisanayo sokuhlangana ngu-\(t_\mathrm {s}~\le ~200\) ns, kanye ne-coefficient yokusabalalisa \(D~\le\) 10\(^{-5}\) cm\(^ 2 \ )/ s) Ukujiya okuphezulu ngokuphawulekayo kwabonwa noma kudingwa ekwakhekeni kwe-LSFL-II30.Ngakolunye uhlangothi, ukushisa nakho kuthinta ukwakheka kwe-HSFL futhi yingakho izinto ezihlakazekayo ezidingekayo ukuze zishintshele kumodi yokuqina yohlobo lwe-LSFL-II d.Ukuvezwa kwama-nanovoid avaleleke ngaphansi kwendawo kuphakamisa ukubandakanyeka kwawo ekwakhiweni kwe-HSFL39.Lezi zinkinga zingase zimelele umsuka kazibuthe we-HSFL ngenxa yamaphethini okuqina ezikhathini ezithile aphezulu adingekayo14,17,19,29.Ngaphezu kwalokho, lezi zindlela zokuqina ezikhiqiziwe zifana kakhulu nenani elikhulu lama-nanovoids19.Ngakho-ke, isizathu sokwanda kwesigameko se-HSFL singachazwa ngokushintsha kwamandla e-crystal defects njengoba \(T_\mathrm{s}\) ikhula.
Kusanda kuboniswa ukuthi izinga lokupholisa le-silicon liyipharamitha eyinhloko ye-intrinsic interstitial supersaturation futhi ngaleyo ndlela ekuqoqweni kwamaphutha amaphuzu ngokwakhiwa kwe-dislocations40,41.Ukulingiswa kwe-molecular dynamics yensimbi emsulwa kubonise ukuthi izikhala zikhuphuka kakhulu ngesikhathi sokwenziwa kabusha kwekristalu ngokushesha, futhi yingakho ukunqwabelana kwezikhala ezinsimbi kuqhubeka ngendlela efanayo42,43,44.Ukwengeza, izifundo zokuhlola zamuva zesiliva zigxile endleleni yokwakhiwa kwama-voids namaqoqo ngenxa yokuqoqwa kwamaphoyinti amaphoyinti45.Ngakho-ke, ukwanda kwezinga lokushisa kwesampula \(T_\mathrm {s}\) futhi, ngenxa yalokho, ukwehla kwezinga lokupholisa kungathinta ukwakheka kwama-voids, okuyi-nuclei ye-HSFL.
Uma izikhala ziyizandulela ezidingekayo zemigodi futhi yingakho i-HSFL, izinga lokushisa eliyisampula \(T_s\) kufanele libe nemiphumela emibili.Ngakolunye uhlangothi, i-\(T_s\) ithinta izinga lokwenziwa kabusha kwekristalu futhi, ngenxa yalokho, ukugxila kwamaphutha wamaphuzu (ukugxila kwezikhala) kukristalu elikhulile.Ngakolunye uhlangothi, kuphinde kuthinte izinga lokupholisa ngemva kokuqina, ngaleyo ndlela kuthinte ukusabalalisa kwamaphutha amaphuzu ku-crystal 40,41.Ukwengeza, izinga lokuqiniswa lincike ku-crystallographic orientation futhi ngaleyo ndlela i-anisotropic ephezulu, njengoba kunjalo nokusabalalisa amaphutha amaphuzu42,43.Ngokwalesi sisekelo, ngenxa yempendulo ye-anisotropic yezinto ezibonakalayo, ukusebenzisana kokukhanya nodaba kuba yi-anisotropic, okubuye kukhulise lokhu kukhululwa kwamandla ngezikhathi ezithile.Okwezinto ze-polycrystalline, lokhu kuziphatha kungakhawulwa ngosayizi wohlamvu olulodwa.Eqinisweni, ukwakheka kwe-LIPSS kubonisiwe kuye ngokuthi okusanhlamvu46,47.Ngakho-ke, umthelela wesampula wokushisa \(T_s\) kuzinga lokucwebezela ungase ungabi namandla njengomphumela wokuma kokusanhlamvu.Ngakho, i-crystallographic orientation ehlukene yezinhlamvu ezahlukene inikeza incazelo engaba khona yokwanda kwe-voids nokuhlanganiswa kwe-HSFL noma i-LSFL-II, ngokulandelanayo.
Ukuze kucaciswe izinkomba zokuqala zalo mcabango, amasampula aluhlaza aqoshwa ukuze embule ukwakheka okusanhlamvu eduze nendawo.Ukuqhathanisa okusanhlamvu emkhiwaneni.I-S3 ikhonjiswe endabeni yokwengeza.Ngaphezu kwalokho, i-LSFL-I ne-LSFL-II zivele ngamaqembu kumasampuli ashisayo.Ubukhulu kanye nejiyomethri yalawa maqoqo ahambisana nosayizi wokusanhlamvu.
Ngaphezu kwalokho, i-HSFL yenzeka kuphela ebangeni elincane emazingeni aphansi okuguquguquka ngenxa yomsuka wayo oguqukayo19,29,48.Ngakho-ke, ekuhlolweni, lokhu cishe kwenzeka kuphela emaphethelweni ephrofayili yesigxobo.Ngakho-ke, i-HSFL yakheka endaweni engafakwa i-oxidized noma endaweni ene-oxidized ebuthakathaka, okuye kwabonakala lapho kuqhathaniswa izingxenyana ze-oxide zamasampuli alashiwe nanganakiwe (bona ithebula reftab: isibonelo).Lokhu kuqinisekisa umcabango wokuthi ungqimba lwe-oxide lubangelwa ikakhulukazi i-laser.
Uma kucatshangelwa ukuthi ukwakheka kwe-LIPSS ngokuvamile kuncike enanini lokushaya ngenxa yempendulo ephakathi kwe-pulse, ama-HSFL angathathelwa indawo izakhiwo ezinkudlwana njengoba ukushayisana kwe-pulse kukhuphuka19.I-HSFL engajwayelekile iphumela kuphethini yokuqina engajwayelekile (d-mode) edingekayo ukuze kwenziwe i-LSFL-II.Ngakho-ke, njengoba ukugqagqana kwe- \(o_\mathrm {p}\) kwanda (bona i-Fig. 1 kusuka ku-de), ukujwayelekile kwe-LSFL-II kuncipha.
Lolu cwaningo luphenye umthelela wezinga lokushisa elingaphansi komhlaba ku-morphology engaphezulu ye-laser structured DLIP ephathwa ngensimbi engagqwali.Kutholwe ukuthi ukushisisa i-substrate kusuka ku-21 kuya ku-250°C kuholela ekwehleni kokushona kokukhishwa kusuka ku-1.75 kuya ku-0.87 µm ku-s-polarization futhi kusuka ku-2.33 kuya ku-1.06 µm ku-p-polarization.Lokhu kuncipha kungenxa yoshintsho ohlotsheni lwe-LIPSS olusuka ku-LSFL-I ukuya ku-LSFL-II, oluhlotshaniswa nesendlalelo se-laser-induced surface oxide kuzinga lokushisa eliphakeme lesampula.Ngaphezu kwalokho, i-LSFL-II ingase ikhulise i-threshold flux ngenxa yokwanda kwe-oxidation.Kucatshangwa ukuthi kulolu hlelo lobuchwepheshe olunokugqagqana okuphezulu kwe-pulse, ukuminyana kwamandla okumaphakathi kanye nesilinganiso sokuphindaphinda esimaphakathi, ukwenzeka kwe-LSFL-II nakho kunqunywa ukuguqulwa kokuguquguquka kokugudluka okubangelwa ukushisa kwesampula.Ukuhlanganiswa kwe-LSFL-II kucatshangelwa ukuthi kungenxa yokwakheka kwe-nanovoid encike kokusanhlamvu, okuholela ku-HSFL njengesandulela ku-LSFL-II.Ukwengeza, ithonya lesiqondiso se-polarization esikhathini sesakhiwo kanye nomkhawulokudonsa wenkathi yesakhiwo kufundwa.Kuvele ukuthi i-p-polarization iphumelela kakhulu kunqubo ye-DLIP mayelana nokujula kokukhishwa kwe-ablation.Sekukonke, lolu cwaningo lwembula isethi yamapharamitha wenqubo ukuze ulawule futhi uthuthukise ukujula kokukhishwa kwe-DLIP ukuze udale amaphethini angaphezulu angokwezifiso.Okokugcina, uguquko olusuka ku-LSFL-I ukuya ku-LSFL-II luqhutshwa ukushisa ngokuphelele futhi nokwenyuka okuncane kwezinga lokuphindaphinda kulindeleke ngokunqwabelanisa kwe-pulse okuqhubekayo ngenxa yokwanda kokushisa kwe-24.Zonke lezi zici zihlobene nenselele ezayo yokwandisa inqubo ye-DLIP, isibonelo ngokusebenzisa amasistimu wokuskena we-polygonal49.Ukuze kuncishiswe ukunqwabelana kokushisa, iqhinga elilandelayo lingalandelwa: gcina isivinini sokuskena se-polygonal scanner siphezulu ngangokunokwenzeka, usizakala ngosayizi wendawo ye-laser enkulu, i-orthogonal ukuya lapho kuskena khona, nokusebenzisa ukukhishwa okuphelele.ngokushelelayo 28. Ukwengeza, le mibono ivumela ukudalwa kwe-topography ye-hierarchical eyinkimbinkimbi yokusebenza kwendawo ethuthukisiwe kusetshenziswa i-DLIP.
Kulolu cwaningo, kusetshenziswe amapuleti ensimbi angenasici (X5CrNi18-10, 1.4301, AISI 304) angu-0.8 mm ubukhulu.Ukuze kukhishwe noma yikuphi ukungcola ebusweni, amasampula ahlanzwa ngokucophelela nge-ethanol ngaphambi kokwelashwa nge-laser (ukuhlushwa okuphelele kwe-ethanol \(\ge\) 99.9%).
Ukulungiselelwa kwe-DLIP kuboniswe kuMfanekiso 4. Amasampuli akhiwe kusetshenziswa isistimu ye-DLIP efakwe umthombo we-laser we-ultrashort we-12 ps ultrashort onobude begagasi obungu-532 nm kanye nezinga eliphezulu lokuphindaphinda elingu-50 MHz.Ukusatshalaliswa kwendawo kwamandla e-beam yi-Gaussian.Ama-optics aklanywe ngokukhethekile ahlinzeka ngokucushwa kwe-interferometric ye-dual-beam ukuze kudalwe izakhiwo zomugqa kusampula.Ilensi enobude obugxilwe obungu-100 mm ibeka ngaphezu kwemishayo ye-laser emibili eyengeziwe endaweni nge-engeli engashintshi engu-6.8\(^\circ\), enikeza isikhathi sendawo esingaba ngu-4.5 µm.Ulwazi olwengeziwe mayelana nokusetha kokuhlola lungatholakala kwenye indawo50.
Ngaphambi kokucutshungulwa kwe-laser, isampula ifakwa epuleti lokushisa endaweni yokushisa ethile.Izinga lokushisa lepuleti lokufudumeza lalibekwe ku-21 no-250 ° C.Kuzo zonke izivivinyo, indiza ephambanayo yomoya ocindezelwe yasetshenziswa ngokuhambisana nemishini yokukhipha umoya ukuze kuvinjelwe ukufakwa uthuli kuma-optics.Isistimu yesiteji engu-x,y iyasethwa ukuze imise isampula ngesikhathi sokuhlela.
Isivinini sesistimu yesiteji sokuma sahluka ukusuka ku-66 kuya ku-200 mm/s ukuze kutholwe ukugqagqana phakathi kwama-pulses angu-99.0 kuya ku-99.67 \(\%\) ngokulandelanayo.Kuzo zonke izimo, izinga lokuphindaphinda laligxilwe ku-200 kHz, futhi amandla ajwayelekile ayengu-4 W, owanikeza amandla nge-pulse engu-20 μJ.Ububanzi be-beam obusetshenziswe ocwaningweni lwe-DLIP cishe bungu-100 µm, futhi umphumela wokuminyana kwamandla we-laser ngu-0.5 J/cm\(^{2}\).Isamba samandla akhishiwe indawo ngayinye iwukushelela kokuqongelela okuphezulu okuhambisana no-50 J/cm\(^2\) kokuthi \(o_{\mathrm {p}}\) = 99.0 \(\%\), 100 J/cm \(^2\) kokuthi \(o_{\mathrm {p))\)=99.5\(\%\) kanye no-150 J/cm\(^2\) kokuthi \(o_{ \mathrm {p} }\) ) = 99.67 \(\%\).Sebenzisa \(\lambda\)/2 plate ukuze uguqule i-polarization ye-laser beam.Kusethi ngayinye yamapharamitha asetshenzisiwe, indawo ecishe ibe ngu-35 × 5 mm\(^{2}\) ibhalwe kusampula.Konke ukuhlola okuhleliwe kwenziwa ngaphansi kwezimo ezizungezile ukuze kuqinisekiswe ukusebenza kwezimboni.
I-morphology yamasampula yahlolwa kusetshenziswa isibonakhulu esine-confocal esine-50x magnification kanye nesixazululo esibonakalayo nesiqondile esingu-170 nm no-3 nm, ngokulandelana.Idatha eqoqiwe ye-topographic yabe isihlolwa kusetshenziswa isofthiwe yokuhlaziya indawo engaphezulu.Khipha amaphrofayili kudatha yendawo ngokuya nge-ISO 1661051.
Amasampula aphinde abonakala kusetshenziswa isibonakhulu se-electron yokuskena ku-voltage esheshayo engu-6.0 kV.Ukwakheka kwamakhemikhali okungaphezulu kwamasampuli kwahlaziywa kusetshenziswa okunamathiselwe kwi-X-ray spectroscopy (EDS) ehlukanisa amandla amandla kagesi asheshayo angu-15 kV.Ngaphezu kwalokho, isibonakhulu esibonakalayo esinenjongo engu-50x sasetshenziswa ukuze kutholwe i-granular morphology ye-microstructure yamasampuli. Ngaphambi kwalokho, amasampula aqoshwe ekushiseni okungaguquki okungu-50 \(^\circ\)C imizuzu emihlanu endaweni yensimbi engagqwali ene-hydrochloric acid ne-nitric acid concentration ka-15–20 \(\%\) kanye ne-1\( -<\)5 \(\%\), ngokulandelana. Ngaphambi kwalokho, amasampula aqoshwe ekushiseni okungaguquki okungu-50 \(^\circ\)C imizuzu emihlanu endaweni yensimbi engagqwali ene-hydrochloric acid ne-nitric acid concentration ka-15–20 \(\%\) kanye ne-1\( -<\)5 \(\%\), ngokulandelana. Перед этим образцы травили при постоянной температуре 50 \(^\circ\)S в течение пяти минут в краске из нержавеюной температур 15-20 \(\%\) kanye 1\( -<\)5 \( \%\) соответственно. Ngaphambi kwalokho, amasampula aqoshwe ekushiseni okungaguquki okungu-50 \(^\circ\)C imizuzu emihlanu ngopende wensimbi engagqwali ne-hydrochloric ne-nitric acid ene-concentration ye-15-20 \(\%\) kanye ne-1\( -<\)5 \( \%\) ngokulandelana.在此之前，樣品在不锈钢染色液中以50 \(^\circ\)C 的恒温蚀刻五分钟，盐酸和硝酸(浓度\15–20)<(1) (1) (1) (1) (\%\), 分别。在此之前，樣品在不锈钢染色液中以50 \(^\circ\)C (\%\)，分别。Ngaphambi kwalokho, amasampula ayefakwe emanzini abandayo imizuzu emihlanu ekushiseni okungaguquki okungu-50 \(^\circ\)C esixazululweni sokungcolisa insimbi engagqwali ene-hydrochloric ne-nitric acid 15-20 \(\%\) no-1. \.(-<\)5 \ (\%\) соответственно. (-<\)5 \ (\%\) ngokulandelana.
Umdwebo wohlelo lokusethwa kokuhlolwa kokusethwa kwe-DLIP enezingongolo ezimbili, okuhlanganisa (1) i-laser beam, (2) ipuleti \(\lambda\)/2, (3) ikhanda le-DLIP elinokucushwa okuthile, (4) ) i-hot plate, (5) i-cross-fluidic , (6) x,y izinyathelo zokumisa kanye (7) nezifanekiso zensimbi engagqwali.Imishayo emibili ebekwe phezulu, eyindilinga ngokubomvu kwesokunxele, yakha izakhiwo zomugqa kusampula kuma-engeli \(2\theta\) (okuhlanganisa kokubili u-s- no-p-polarization).
Amasethi edatha asetshenzisiwe kanye/noma ahlaziywa ocwaningweni lwamanje ayatholakala kubabhali abafanele uma kunesicelo esifanele.
Isikhathi sokuthumela: Jan-07-2023